Structural properties of relaxed thin film germanium layers grown by low temperature RF-PECVD epitaxy on Si and Ge (100) substrates
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Characterization of GaAs grown by molecular beam epitaxy on vicinal Ge„100... substrates
In this article we investigate the growth of GaAs on two different vicinal surfaces of Ge ~100!, cut 6° off the ~100! plane toward the ~110! plane or toward the ~111! plane. Both substrates exhibit evidence of a regular array of double steps. Ge substrates and GaAs films are characterized with low energy electron diffraction, low temperature photoluminescence, scanning tunneling microscopy, ele...
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2014
ISSN: 2158-3226
DOI: 10.1063/1.4886774